- Item Number:
- ALB-Cr-Al-ST
- Product Name:
- Chromium Aluminium (Cr-Al) Alloy Sputtering Targets
- Formula:
- Cr-Al (Cr50Al50,Cr30Al70 at% etc.)
- Purity:
- 99.8%
Price($, USD):
- ($, USD)Inquiry
- Supplier:
- ALB Materials Inc
- Shape:
- Rotary Sputtering Targets, Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made
- Size:
- Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm
- Synonyms:
Chromium Aluminium (Cr-Al) Alloy Sputtering Targets, Cr-Al Alloy Sputtering Target, Cr-Al Alloy Sputter Target, Cr-Al Alloy Target, Chromium Aluminium Alloy Sputtering Target, Chromium Aluminium Alloy Sputter Target, Chromium Aluminium Alloy Target
- COA:
- MSDS:
- Related Products:
- Chromium Products,Aluminum Products
Chromium Aluminium (Cr-Al) Alloy Sputtering Targets: Aluminium content can be 10%-90%at.
Typical Composition (at%) of Chromium Aluminium (Cr-Al) Alloy Sputtering Targets include Cr30Al70 at% and Cr50Al50 at%.
Cr30Al70 Sputtering Targets
Purity: 99.8%
Density: >=3.73 g/cm3
Grain Size: <100um
Thermal conductivity: 150 W/m.K
Size:
Planar Sputtering Targets: <=1500x500mm
Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)
Cr50Al50 Sputtering Targets
Purity: 99.8%
Density: >=4.55 g/cm3
Grain Size: <100um
Thermal conductivity: 120 W/m.K
Size:
Planar Sputtering Targets: <=1500x500mm
Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)
Other multiple alloy Cr-Al-X (X=Si, Ti, Y, B, V) sputtering targets can be custom-made.
