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Zirconium Boride Sputtering Targets

Tantalum 02/23/2021

Zirconium Boride sputtering target for hard material coatings or cutting tools. ALB Materials Inc carefully produces Titanium diboride TiB2, Zirconium diboride ZrB2, and Chromium diboride CrB2.

Zirconium Boride (ZrB2) Sputtering Targets

Zirconium Boride (ZrB2) Sputtering Targets



Borides play an important role in the process of steel hardening and show good resistance to oxidation, excellent resistance to corrosion, and good thermal conductivity.

They are often used as high-performance ceramics in applications like sputtering targets for hard material coatings or cutting tools.

Titanium diboride TiB2

Titanium diboride exhibits high strength, extreme hardness, good resistance to high temperatures, good electrical conductivity, and excellent resistance to oxidation.

TiB2 is chemically stable against numerous molten metals.

Zirconium diboride ZrB2

In a similar way to titanium diboride, zirconium diboride, ZrB2, exhibits high electrical conductivity and good resistance to oxidation.

Chromium diboride CrB2

Zrb2 Nanoparticles Xinglu Nano Zirconium Boride

Chromium diborides are hard materials with excellent resistance to corrosion and good thermal conductivity.


TiB2 is used as a high-performance ceramic for the following applications:

Cathode material for aluminum smelting flux electrolysis

The sputtering target for hard material coatings

Evaporator boats


Offer best Zirconium Boride Sputtering Target for sale by USA wholesale ZrB2 manufacturers、suppliers、factory.



high quality Superfine boron B powder

Zirconium diboride (ZrB2) is a highly covalent refractory ceramic material with a hexagonal crystal structure.

ZrB2 is an ultra-high temperature ceramic (UHTC) with a melting point of 3246 °C.

This along with its relatively low density of ~6.09 g/cm3 (measured density may be higher due to hafnium impurities) and good high-temperature strength makes it a candidate for high-temperature aerospace applications such as hypersonic flight or rocket propulsion systems.

It is an unusual ceramic, having relatively high thermal and electrical conductivities, properties it shares with isostructural titanium diboride and hafnium diboride.

Chemical formula:ZrB2

Zirconium Boride Sputtering Targets


USA Zirconium Boride (ZrB2) Ceramic Sputtering Targets, Find details about USA Zrb2 Target, Sputtering Targets from Zirconium Boride (ZrB2) ceramic sputtering targets

ALB material supply all kinds of the ceramic sputtering target

compound semiconductor target include Oxide sputtering target

Hot pressed ceramics materials Titanium Boride

Fluoride sputtering target

Boride sputtering target

Carbide sputtering target

Nitride sputtering target

Sulfide sputtering target

Selenide sputtering target

Silicide sputtering target

Telluride sputtering target

Antimonide sputtering target

Arsenide sputtering targe

Zirconium Boride Zirconium Powder Price 99


Sputtering is a proven technology capable of depositing thin films from a wide ... Silicon dioxide SiO2, Zirconium boride ZrB2, various metals, and their alloys.

Nanometre Powders Sputtering Targets

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes.

The process is repeatable and can be scaled up from small research and development projects to production batches involving medium to large substrate areas.

The sputtering gas is often an inert gas such as argon.

For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon.

Reactive gases are used to sputter compounds.

The chemical reaction can occur on the target surface, in-flight, or on the substrate depending on the process parameters.

The many parameters make sputter deposition a complex process but allow experts a large degree of control over the growth and microstructure of the film.

Factory Supply Nano Carbon Powder Carbon

To achieve the desired characteristics in a sputter deposited thin film, the manufacturing process used to fabricate the sputtering target can be critical.

Whether the target material comprises only an element, The mixture of elements, alloys, or perhaps a compound;

the process to produce that defined material in a form suitable for sputtering thin films of consistent quality is as essential as the deposition run parameters perfected by the thin film process engineers and scientists.

Most sputtering target materials can be fabricated into a wide range of shapes and sizes.

There are some technical limitations to the maximum size for a given single-piece construction.

In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.

Commonly used targets are circular or rectangular, although other shapes including square and triangular designs can also be produced.

Pure Metal Targets

An extensive range of metal targets in sizes ranging from 1 inch in diameter to several meters long rectangular plates.

Sputter target materials can be generally supplied within the purity range of 99% to 99.9999% but the higher purities are more material-dependent [...]

Small Bench Top Coater Targets

These 0.1-0.5mm thick targets are mostly made of Titanium Ti, Chromium Cr, Tantalum Ta, Gold Au, Silver-Ag, Platinum Pt, Palladium Pd, and their alloys.

As an excellent manufacturer and exporter of Zirconium Boride Sputtering Targets, ALB Deposition aims of providing high-quality ZrB2 sputtering targets

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