- Item Number:
- Product Name:
- Tantalum (Ta) Sputtering Targets
- CAS Number:
- ($, USD)Inquiry
- ALB Materials Inc
- Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made
- Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm
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- Related Products:
- Metals and Alloys,Tantalum Products
Tantalum (Ta) Sputtering Targets Description:
Tantalum (Ta) Sputtering Targets are made from tantalum plate. Because tantalum has the ability to form thin oxides, and the resulting oxide film has a protective effect, tantalum is widely used as a base material for electrolyte capacitor manufacturing.
ALB Materials Inc is a global supplier of Tantalum (Ta) Sputtering Targets and we can provide customized tantalum products. ALB's Tantalum (Ta) Sputtering Targets is manufactured through Cold-Working Process, through forging, rolling, swaging, and drawing to get the desired size.
Tantalum (Ta) Sputtering Targets Applications:
- Used in thermal inkjet printhead, can form anti cavitation film.
- Used in integrated circuit with the base coating process to form a tantalum film which can prevent the diffusion of copper into the substrate silicon.
- Used in liquid crystal display (LCD), as well as heat, corrosion resistance, high conductivity and other coating industries.
Tantalum (Ta) Sputtering Targets Specification:
Tantalum (Ta) Sputtering Targets: R05200(Electron beam or vacuum-arc cast tantalum), R05400(Sintered tantalum)
Tantalum Tungsten Alloy Sputtering Targets: R05252(Ta2.5W Sputtering Targets), R05255(Ta10W Sputtering Targets), Ta7.5W Sputtering Targets
Tantalum Niobium Alloy Sputtering Targets: R05240(Ta-40Nb Sputtering Targets), Ta-3Nb Sputtering Targets, Ta-20Nb Sputtering Targets, Ta-30Nb Sputtering Targets
Purity: 99.95%, 99.99%
Standard: ASTM B 708
Dimensions: Diameter: 15-400mm; Thickness: 3-28mm