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Tantalum (Ta) Sputtering Targets

Item Number:
ALB-Ta-ST
Product Name:
Tantalum (Ta) Sputtering Targets
CAS Number:
[7440-25-7]
Formula:
Ta
Purity:
99.95%

Price($, USD):

$450.00/pc for Size 3.00" Dia. x 0.125" Thick($, USD)Inquiry
Supplier:
ALB Materials Inc
Shape:
Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made
Size:
Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm
Synonyms:

Tantalum (Ta) Sputtering Targets, Ta Sputtering Target, Ta Sputter Target, Ta Target, Tantalum Sputtering Target, Tantalum Sputter Target, Tantalum Target

COA:
COA of Tantalum (Ta) Sputtering Targets
MSDS:
MSDS of Tantalum (Ta) Sputtering Targets
Related Products:
Metals and Alloys,Tantalum Products

Pictures of Tantalum (Ta) Sputtering Targets:

Tantalum (Ta) Sputtering Targets Description:
Tantalum (Ta) Sputtering Targets are made from tantalum plate. Because tantalum has the ability to form thin oxides, and the resulting oxide film has a protective effect, tantalum is widely used as a base material for electrolyte capacitor manufacturing.
ALB Materials Inc is a global supplier of Tantalum (Ta) Sputtering Targets and we can provide customized tantalum products. ALB's Tantalum (Ta) Sputtering Targets is manufactured through Cold-Working Process, through forging, rolling, swaging, and drawing to get the desired size.

Tantalum (Ta) Sputtering Targets Applications:

  • Used in thermal inkjet printhead, can form anti cavitation film.
  • Used in integrated circuit with the base coating process to form a tantalum film which can prevent the diffusion of copper into the substrate silicon.
  • Used in liquid crystal display (LCD), as well as heat, corrosion resistance, high conductivity and other coating industries.


Tantalum (Ta) Sputtering Targets Specification:

Material:
Tantalum (Ta) Sputtering Targets: R05200(Electron beam or vacuum-arc cast tantalum), R05400(Sintered tantalum)
Tantalum Tungsten Alloy Sputtering Targets: R05252(Ta2.5W Sputtering Targets), R05255(Ta10W Sputtering Targets), Ta7.5W Sputtering Targets
Tantalum Niobium Alloy Sputtering Targets: R05240(Ta-40Nb Sputtering Targets), Ta-3Nb Sputtering Targets, Ta-20Nb Sputtering Targets, Ta-30Nb Sputtering Targets
Purity: 99.95%, 99.99%
Standard: ASTM B 708
Dimensions: Diameter: 15-400mm; Thickness: 3-28mm


Tantalum and Tantalum Alloy
R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both. (Ta)
R05400, unalloyed tantalum, powder-metallurgy consolidation. (Ta)
R05255, tantalum alloy, 90% tantalum, 10% tungsten, electron-beam furnace of vacuum-arc melt, or both. (Ta10W)
R05252, tantalum alloy, 97.5% tantalum, 2.5% tungsten, electron-beam furnace or vacuum-arc melt, or both. ( Ta2.5W)
R05240, tantalum alloy, 60% tantalum, 40% niobium, electron-beam furnace or vacuum-arc melt. (Ta-40Nb)

Chemical Composition:

Element

R05200 (%,Max)

R05400 (%,Max)

R05255 (Ta10W) / (%,Max)

R05252 (Ta2.5W) / (%,Max)

R05240 (Ta-40Nb) (%,Max)

C

0.01

0.01

0.01

0.01

0.01

O

0.015

0.03

0.015

0.015

0.02

N

0.01

0.01

0.01

0.01

0.01

H

0.0015

0.0015

0.0015

0.0015

0.0015

Fe

0.01

0.01

0.01

0.01

0.01

Mo

0.02

0.02

0.02

0.02

0.02

Nb

0.1

0.1

0.1

0.5

35.0–42.0

Ni

0.01

0.01

0.01

0.01

0.01

Si

0.005

0.005

0.005

0.005

0.005

Ti

0.01

0.01

0.01

0.01

0.01

W

0.05

0.05

9.0–11.0

2.0–3.5

0.05


Mechanical properties (annealed condition):

Size Tensile strength, psi (MPa), ≥ Yield strength, psi (MPa), ≥ Elongation (%), ≥

Pure Tantalum sheet, Sputtering Targets and plate (R05200, R05400)

Thickness<0.060"(1.524mm) 30000 (207) 20000 (138) 20
Thickness≥0.060"(1.524mm) 25000 (172) 15000 (103) 30

Ta-10W (R05255) Tantalum tungsten alloy sheet and plate

Thickness<0.125" (3.175mm) 70000 (482) 60000 (414) 15
Thickness≥0.125" (3.175mm) 70000 (482) 55000 (379) 20

Ta-2.5W (R05252) Tantalum tungsten alloy sheet and plate

Thickness<0.125" (3.175mm) 40000 (276) 30000 (207) 20
Thickness≥0.125" (3.175mm) 40000 (276) 22000 (152) 25

Ta-40Nb (R05240) Tantalum niobium alloy sheet and plate

Thickness<0.060"(1.524mm) 40000 (276) 20000 (138) 25
Thickness>0.060"(1.524mm) 35000 (241) 15000 (103) 25


Tantalum (Ta) Sputtering Targets Packaging:
Our Tantalum (Ta) Sputtering Targets are carefully packed to prevent damage during storage & transportation. Wooden crate is applied when the cargo is over weight.
Wooden crate Packing
Material Safety Data Sheet (MSDS) of Tantalum (Ta) Sputtering Targets

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