ALB's Organic Chemicals Website: www.albtechnology.com
ALB's Magnets Website: www.albmagnets.com

Tantalum (Ta) Sputtering Targets

Item Number:
ALB-Ta-ST
Product Name:
Tantalum (Ta) Sputtering Targets
CAS Number:
[7440-25-7]
Formula:
Ta
Purity:
99.95%

Price($, USD):

($, USD)Inquiry
Supplier:
ALB Materials Inc
Shape:
Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made
Size:
Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm
Synonyms:

Tantalum (Ta) Sputtering Targets, Ta Sputtering Target, Ta Sputter Target, Ta Target, Tantalum Sputtering Target, Tantalum Sputter Target, Tantalum Target

COA:
COA of Tantalum (Ta) Sputtering Targets
MSDS:
MSDS of Tantalum (Ta) Sputtering Targets
Related Products:
Metals and Alloys,Tantalum Products

Tantalum (Ta) Sputtering Targets Description:
Tantalum (Ta) Sputtering Targets are made from tantalum plate. Because tantalum has the ability to form thin oxides, and the resulting oxide film has a protective effect, tantalum is widely used as a base material for electrolyte capacitor manufacturing.
ALB Materials Inc is a global supplier of Tantalum (Ta) Sputtering Targets and we can provide customized tantalum products. ALB's Tantalum (Ta) Sputtering Targets is manufactured through Cold-Working Process, through forging, rolling, swaging, and drawing to get the desired size.

Tantalum (Ta) Sputtering Targets Applications:

  • Used in thermal inkjet printhead, can form anti cavitation film.
  • Used in integrated circuit with the base coating process to form a tantalum film which can prevent the diffusion of copper into the substrate silicon.
  • Used in liquid crystal display (LCD), as well as heat, corrosion resistance, high conductivity and other coating industries.


Tantalum (Ta) Sputtering Targets Specification:

Material:
Tantalum (Ta) Sputtering Targets: R05200(Electron beam or vacuum-arc cast tantalum), R05400(Sintered tantalum)
Tantalum Tungsten Alloy Sputtering Targets: R05252(Ta2.5W Sputtering Targets), R05255(Ta10W Sputtering Targets), Ta7.5W Sputtering Targets
Tantalum Niobium Alloy Sputtering Targets: R05240(Ta-40Nb Sputtering Targets), Ta-3Nb Sputtering Targets, Ta-20Nb Sputtering Targets, Ta-30Nb Sputtering Targets
Purity: 99.95%, 99.99%
Standard: ASTM B 708
Dimensions: Diameter: 15-400mm; Thickness: 3-28mm

 

Common Size Tantalum (Ta) Sputtering Targets:

Item No. Formula Purity Size Inquiry
ALB-Ta-ST-D1x1/8 Ta 99.95% 1" dia. X 1/8" thick Inquiry
ALB-Ta-ST-D1x1/4 Ta 99.95% 1" dia. X 1/4" thick Inquiry
ALB-Ta-ST-D2x1/8 Ta 99.95% 2" dia. X 1/8" thick Inquiry
ALB-Ta-ST-D2x1/4 Ta 99.95% 2" dia. X 1/4" thick Inquiry
ALB-Ta-ST-D3x1/8 Ta 99.95% 3" dia. X 1/8" thick Inquiry
ALB-Ta-ST-D3x1/4 Ta 99.95% 3" dia. X 1/4" thick Inquiry

Send us a quick inquiry now to find out more information and the latest prices,thanks!
* These fields are required. Without such information, we are not able to process your inquiry.

  • Not clear? Click to refresh. Not clear? Click to refresh.