- Item Number:
- ALB-Ti-Al-ST
- Product Name:
- Titanium Aluminum (Ti-Al) Alloy Sputtering Targets
- Formula:
- Ti-Al (Ti33Al67, Ti50Al50, Ti70Al30 at% etc.)
- Purity:
- 99.8%
Price($, USD):
- ($, USD)Inquiry
- Supplier:
- ALB Materials Inc
- Shape:
- Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made
- Size:
- Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm
- Synonyms:
Titanium Aluminum (Ti-Al) Alloy Sputtering Targets, Ti-Al Alloy Sputtering Target, Ti-Al Alloy Sputter Target, Ti-Al Alloy Target, Titanium Aluminum Alloy Sputtering Target, Titanium Aluminum Alloy Sputter Target, Titanium Aluminum Alloy Target
- COA:
- MSDS:
- Related Products:
- Titanium Products,Aluminum Products
Titanium Aluminum (Ti-Al) Alloy Sputtering Targets: Aluminium content can be 10%-90%at.
Typical Composition (at%) of Titanium Aluminum (Ti-Al) Alloy Sputtering Targets include Ti33Al67 at%, Ti50Al50 at% and Ti70Al30 at%.
Ti33Al67 Sputtering Targets
Purity: 99.8%
Density: >=3.29 g/cm3
Grain Size: <100um
Thermal conductivity: 98 W/m.K
Size:
Planar Sputtering Targets: <=1500x500mm
Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)
Ti50Al50 Sputtering Targets
Purity: 99.8%
Density: >=3.60 g/cm3
Grain Size: <100um
Thermal conductivity: 70 W/m.K
Size:
Planar Sputtering Targets: <=1500x500mm
Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)
Ti70Al30 Sputtering Targets
Purity: 99.8%
Density: >=3.95 g/cm3
Grain Size: <100um
Thermal conductivity: 40 W/m.K
Size:
Planar Sputtering Targets: <=1500x500mm
Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)
Other multiple alloy Ti-Al-X (X=Si, Cr, Y, B, V) sputtering targets can be custom-made.
